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Eighth International Symposium on Plasma Chemistry, Tokyo, Japan, 31 August–4 September 1987

This conference is part of the Plasma Chemistry series.
I. Tanaka
Control and diagnostics of reactive plasma by photochemical and photoionization techniques
1988, Vol. 60, Issue 5, pp. 587-589 [Details] [Full text - pdf 208 kB]
E. Pfender
Thermal plasma processing in the nineties
1988, Vol. 60, Issue 5, pp. 591-606 [Details] [Full text - pdf 1127 kB]
H. Biederman, L. Martinu, D. Slavinska and I. Chudacek
Plasma deposition and properties of composite metal/polymer and metal/hard carbon films
1988, Vol. 60, Issue 5, pp. 607-618 [Details] [Full text - pdf 1390 kB]
S. L. Camacho
Industrial-worthy plasma torches: State-of-the-art
1988, Vol. 60, Issue 5, pp. 619-632 [Details] [Full text - pdf 2639 kB]
P. Capezzuto and G. Bruno
Plasma deposition of amorphous silicon films: an overview on some open questions
1988, Vol. 60, Issue 5, pp. 633-644 [Details] [Full text - pdf 783 kB]
J.-S. Chang and S. Masuda
Mechanism of the ozone formations in a near liquid nitrogen temperature medium pressure glow discharge positive column
1988, Vol. 60, Issue 5, pp. 645-650 [Details] [Full text - pdf 345 kB]
X. Chen
Particle heating in a thermal plasma
1988, Vol. 60, Issue 5, pp. 651-662 [Details] [Full text - pdf 823 kB]
Ivo Gallimberti
Impulse corona simulation for flue gas treatment
1988, Vol. 60, Issue 5, pp. 663-674 [Details] [Full text - pdf 758 kB]
V. Helbig
Diagnostics of thermal plasma
1988, Vol. 60, Issue 5, pp. 675-684 [Details] [Full text - pdf 624 kB]
Hiroki Haraguchi, T. Hasegawa and Mohamad Abdullah
Inductively coupled plasmas in analytical atomic spectrometry: excitation mechanisms and analytical feasibilities
1988, Vol. 60, Issue 5, pp. 685-696 [Details] [Full text - pdf 817 kB]
Kei Hozumi
Plasma polymerization of unsaturated alcohols for deposition of hydrophilic thin film
1988, Vol. 60, Issue 5, pp. 697-702 [Details] [Full text - pdf 426 kB]
D. E. Ibbotson
Plasma and gaseous etching of compounds of Groups III-V
1988, Vol. 60, Issue 5, pp. 703-708 [Details] [Full text - pdf 584 kB]
A. Kanzawa
Processing of a thermal plasma flow in a tube
1988, Vol. 60, Issue 5, pp. 709-714 [Details] [Full text - pdf 278 kB]
H. Koinuma
High Tc superconducting oxide films prepared by sputtering
1988, Vol. 60, Issue 5, pp. 715-720 [Details] [Full text - pdf 695 kB]
D. R. MacRae
Plasma reactors for process metallurgy applications
1988, Vol. 60, Issue 5, pp. 721-725 [Details] [Full text - pdf 407 kB]
S. Masuda
Pulse corona induced plasma chemical process: a horizon of new plasma chemical technologies
1988, Vol. 60, Issue 5, pp. 727-731 [Details] [Full text - pdf 766 kB]
A. Matsuda
Amorphous Si and Si-based alloys from glow-discharge plasma
1988, Vol. 60, Issue 5, pp. 733-740 [Details] [Full text - pdf 489 kB]
D. Braun, Ulrich Kuchler and G. Pietsch
Behaviour of NOx in air-fed ozonizers
1988, Vol. 60, Issue 5, pp. 741-746 [Details] [Full text - pdf 321 kB]
A. Ricard, G. Henrion, H. Michel and M. Gantois
Excited states of plasmas for steel surface nitriding and TiN deposition
1988, Vol. 60, Issue 5, pp. 747-751 [Details] [Full text - pdf 290 kB]
D. I. Slovetsky
Mechanisms of decomposition of hydrocarbons in electrical discharges
1988, Vol. 60, Issue 5, pp. 753-768 [Details] [Full text - pdf 1119 kB]
K. Tachibana
Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films
1988, Vol. 60, Issue 5, pp. 769-780 [Details] [Full text - pdf 1023 kB]
T. Takagi
Ionized cluster beam (ICB) deposition and processes
1988, Vol. 60, Issue 5, pp. 781-794 [Details] [Full text - pdf 2029 kB]
G. M. W. Kroesen, C. J. Timmermans and D. C. Schram
Expanding plasma used for plasma deposition
1988, Vol. 60, Issue 5, pp. 795-808 [Details] [Full text - pdf 960 kB]
M. Ushio
Arc discharge and electrode phenomena
1988, Vol. 60, Issue 5, pp. 809-814 [Details] [Full text - pdf 1682 kB]
M. R. Wertheimer, M. Moisan, J. E. Klemberg-Sapieha and R. Claude
Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films
1988, Vol. 60, Issue 5, pp. 815-820 [Details] [Full text - pdf 515 kB]